Application of silicon polymer as positive photosensitive material
Application of silicon polymer as positive photosensitive material
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硅聚合物作为正性感光材料的应用
DOI：
10.1002/pen.760291312
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发表时间：
1989
影响因子：
3.2
通讯作者：
Yoshimasa Aotani
中科院分区：
文献类型：
--
作者：
Toshiaki Aoai;A. Umehara;A. Kamiya;Nobuaki Matsuda;Yoshimasa Aotani
研究了一种以硅醚基为主链和光致酸前驱体的新型硅聚合物正工作光敏体系。硅聚合物被光生酸水解并降解为低分子量化合物。从而降低了聚合物的溶解度抑制作用。与1,2-醌二叠氮化合物相比，该体系具有较高的光敏性，这是由于酸对硅聚合物水解的催化反应。聚合物中硅醚基团周围的化学结构，特别是亲水性较强和空间结构较少的结构，会影响水解速率，从而影响光敏性。在所检测的各种类型的光诱导酸前体中，例如，被三卤甲基取代的s-三嗪和1,3,4-恶二唑化合物是有效的。
A new positive-working photosensitive system of silicon polymer, containing silylether groups in the main chain and a photo-induced acid precursor was investigated. The silicon polymer is hydrolized by a photogenerated acid and degraded to low molecular weight compounds. Thus the effect of solubility inhibition of the polymer is diminished. The higher photosensitivity of this system as compared with 1,2-quinone diazide compounds is due to the catalytic reaction of the acid on the hydrolysis of the silicon polymer. The chemical structure around silylether groups in the polymer, in particular more hydrophilic and less steric structures, affects the rate of hydrolysis and thus the photosensitivity. Among various types of photo-induced acid precursors examined, e.g., s-triazine and 1,3,4-oxadiazole compounds substituted by trihalomethyl groups were effective.