Selective metal pattern formation and its EMI shielding efficiency
Selective metal pattern formation and its EMI shielding efficiency
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DOI：
10.1016/j.apsusc.2005.03.206
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发表时间：
2006-02-15
影响因子：
6.7
通讯作者：
Cho, SH
中科院分区：
文献类型：
--
作者：
Lee, HC;Kim, JY;Cho, SH
提出了一种利用非晶二氧化钛和含空穴捕获剂的聚乙烯醇双层薄膜中光激发电子-空穴对寿命的增加来选择性形成金属图形的新方法。通过在双层膜上的光掩模的紫外照射，光电子的光确定的图像可以容易地和简单地产生，从而导致通过还原的钯（Pd）催化剂的选择性沉积。在钯催化剂上连续化学镀和在化学镀图形上电镀是可能的。此外，还研究了不同线宽和厚度特征长度尺度的金属网格图形的电磁屏蔽效能。(c)2005 Elsevier B. V.保留所有权利。
A novel method for selective metal pattern formation by using an enhanced life-time of photoexcited electron-hole pairs in bilayer thin film of amorphous titanium dioxide and hole-scavenger-containing poly(vinyl alcohol) was proposed. By UV-irradiation through photomask on the bilayer film, the photodefined image of photoelectrons could be easily and simply produced, consequently resulting in selective palladium (Pd) catalyst deposition by reduction. The successive electrolessplating on Pd catalysts and electroplating on electrolessplated pattern were possible. Furthermore, the electromagnetic interference shielding efficiencies of the metal mesh patterns with various characteristic length scales of line width and thickness were investigated. (c) 2005 Elsevier B.V. All rights reserved.