Resist-free patterning of surface architectures in polymer-based microanalytical devices
Resist-free patterning of surface architectures in polymer-based microanalytical devices
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DOI：
10.1021/ja0454135
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发表时间：
2005-01-26
影响因子：
15
通讯作者：
Soper, SA
中科院分区：
文献类型：
--
作者：
McCarley, RL;Vaidya, B;Soper, SA
描述了在微分析装置中使用简单的光致抗蚀剂图案化方法而不需要基于光致抗蚀剂的方法来形成化学反应性表面官能团的图案的能力。直接UV暴露的聚（甲基丙烯酸甲酯），PMMA，和聚（碳酸酯），PC，通过光学掩模的微流体装置的表面导致生产的图案的近单层数量的表面羧酸基团的表面覆盖，X-射线光电子能谱，和荧光显微镜实验确定。通过使用低UV通量和暴露时间来实现反应性羧酸基团的形成，而不对聚合物器件基底造成显著的物理（形貌）损伤。用金属、热响应聚合物和抗体对图案化的表面羧酸基团进行修饰，产生具有金属互连和检测电极的微流体装置，并且能够从溶液中捕获完整的生物细胞和蛋白质。
The ability to form patterns of chemically reactive surface functionalities in microanalytical devices using a simple photopatterning approach without the need for photoresist-based methods is described. Direct UV exposure of the surfaces of poly(methyl methacrylate), PMMA, and poly(carbonate), PC, microfluidic devices through optical masks leads to the production of patterns of near monolayer quantities of surface carboxylic acid groups as determined by surface coverage, X-ray photoelectron spectroscopy, and fluorescence microscopy experiments. Formation of the reactive carboxylic acid groups without significant physical (topographical) damage to the polymer device substrates is achieved by use of low UV fluence and exposure times. Modification of the patterned, surface carboxylic acid groups with metals, thermally responsive polymers, and antibodies results in microfluidic devices possessing metallic interconnects and detection electrodes and the ability to capture intact biological cells and proteins from solution.