The fabrication of x-ray masks using proton beam writing
The fabrication of x-ray masks using proton beam writing
复制标题
使用质子束写入制造 X 射线掩模
DOI：
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发表时间：
2008
期刊：
影响因子：
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通讯作者：
F. Watt
中科院分区：
文献类型：
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作者：
W. Yue;S. Chiam;Y. Ren;J. A. van Kan;T. Osipowicz;L. Jian;H. Moser;F. Watt
我们已经开发了一种简化的方法，制造深X射线光刻的X射线掩模，通过使用质子束写入（PBW），没有随后的软X射线复制步骤。结合直接PBW和随后的电镀，制造了具有高达11 µm高度的金吸收体图案和垂直光滑侧壁的X射线掩模。在这项工作中，吸收体图案的最小尺寸小于0.5微米。掩模用于同步辐射的X射线光刻，并生产出具有光滑侧壁的870 µm SU-8结构。这种制作方法有望成为传统X射线掩模制作方法的重要替代方法。
We have developed a simplified method of fabricating x-ray masks for deep x-ray lithography by using proton beam writing (PBW) without subsequent soft x-ray copying steps. Combining direct PBW and subsequent electroplating, x-ray masks with gold absorber patterns of up to 11 µm height and with vertical and smooth sidewalls were fabricated. The smallest size in the absorber pattern is less than 0.5 µm in this work. The masks were used for x-ray lithography with synchrotron radiation, and 870 µm SU-8 structures with smooth sidewalls were produced. This fabrication method is promising to be an important alternative to conventional methods for x-ray mask making.