Two-dimensional field mapping in MMIC-substrates by electro-optic sampling technique
Two-dimensional field mapping in MMIC-substrates by electro-optic sampling technique
复制标题
通过电光采样技术在 MMIC 基底中进行二维场映射
DOI：
10.1109/mwsym.1992.188281
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发表时间：
1992
期刊：
影响因子：
--
通讯作者：
E. Kubalek
中科院分区：
文献类型：
--
作者：
W. Mertin;C. Bohm;L. Balk;E. Kubalek
介绍了一种利用直接电光采样技术对单片微波集成电路（MMIC）基片进行二维场映射的系统。已进行了高达8.5 GHz的测量。场映射技术的主要应用是对复杂MMIC的分析。所提出的测试技术的特征在于，由于激光束小，可以达到高空间分辨率和高时间分辨率（<5 ps），从而允许以非接触和非侵入的方式进行测试。它提供了对实际内部场分布的快速调查，从而使控制模拟过程成为可能。很明显，通过这些手段，可以实现简单的故障和功能分析内的MMIC，导致显着减少，否则耗时的设计/重新设计循环。<><ETX>
A system for two-dimensional field mapping in MMIC (monolithic microwave integrated circuit) substrates using direct electrooptic sampling is introduced. Measurements up to 8.5 GHz have been made. The main application of the field mapping technique is the analysis of complex MMICs. The proposed test technique is characterized by the fact that, due to the small laser beam, a high spatial resolution and a high temporal resolution (<5 ps) can be reached, allowing testing in a contactless and noninvasive manner. It offers a quick survey of the actual internal field distributions, thus making control of the simulation procedure possible. It is evident that by these means easy failure and function analysis within a MMIC can be achieved, leading to significant reduction of the otherwise time-consuming design/redesign loop.<<ETX>>