Effect of intrinsic stress on the optical properties of nanostructured ZnO thin films grown by rf magnetron sputtering
Effect of intrinsic stress on the optical properties of nanostructured ZnO thin films grown by rf magnetron sputtering
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DOI：
10.1016/j.apsusc.2008.04.012
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发表时间：
2008-08-15
影响因子：
6.7
通讯作者：
Bhalla, G. L.
中科院分区：
文献类型：
--
作者：
Kumar, Rajesh;Khare, Neeraj;Bhalla, G. L.
本文研究了射频磁控溅射法制备ZnO薄膜时，沉积温度对薄膜结构和光学性能的影响。在较低的沉积温度下生长的膜处于大的压应力状态，而在较高的温度（450 ° C）下生长的膜几乎没有应力。在吸收光谱中，观察到ZnO激子和Zn表面等离子体共振（SPR）峰。随着沉积温度的升高，ZnO薄膜的光学带隙也发生了红移。从尺寸效应计算的带隙中的偏移与观察到的偏移值不匹配，并且观察到的偏移归因于膜中存在的压应力。(C)2008年由Elsevier B出版。诉
In this paper we report the effect of deposition temperature on the structural and optical properties of ZnO thin films prepared by rf magnetron sputtering. The films grown at lower deposition temperatures were in a state of large compressive stress, whereas the films grown at higher temperature (450 degrees C) were almost stress free. In the absorption spectra, the ZnO excitonic and the Zn surface plasmon resonance (SPR) peaks have been observed. A redshift in the optical band gap of ZnO films has also been observed with the increase in the deposition temperature. The shift in the band gap calculated from the size effect did not match with the observed shift values and the observed shift has been attributed to the compressive stress present in the films. (C) 2008 Published by Elsevier B. V.