Surface modification of ceria nanoparticles and their chemical mechanical polishing behavior on glass substrate

Surface modification of ceria nanoparticles and their chemical mechanical polishing behavior on glass substrate
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DOI:
10.1016/j.apsusc.2010.01.040
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发表时间:
2010-04-01
影响因子:
6.7
通讯作者:
Song, Zhitang
Song, Zhitang
中科院分区:
材料科学1区
文献类型:
--
作者:
Zhang, Zefang;Yu, Lei;Song, Zhitang

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为了提高纳米CeO_2的化学机械抛光性能,采用硅烷化反应将纳米CeO_2表面的羟基修饰为氨基丙基三乙氧基硅烷(APS)。用傅立叶变换红外光谱(FTIR)、X射线光电子能谱(XPS)、场发射扫描电子显微镜(FE-SEM)、能谱(EDS)、激光粒度分析仪、Zeta电位测量和稳定性测试等手段对改性后的CeO_2粒子的组成、结构和分散性进行了表征。结果表明,APS已成功接枝到CeO2纳米粒子的表面,使改性后的CeO2纳米粒子在水溶液中的分散性和稳定性优于未改性的CeO2纳米粒子。然后,研究了修饰后的纳米CeO2在玻璃基板上的化学机械抛光性能。实验结果表明,改性后的CeO_2颗粒具有较低的材料去除效率(MRR),但表面质量明显好于未改性的CeO_2颗粒,这可能是由于CeO_2颗粒的硬度降低、颗粒与基材表面的润滑性增强以及颗粒之间的团聚消除所致。(C)2010爱思唯尔B.V.保留所有权利。
To improve their chemical mechanical polishing (CMP) performance, ceria nanoparticles were surface modified with gamma-aminopropyltriethoxysilane (APS) through silanization reaction with their surface hydroxyl group. The compositions, structures and dispersibility of the modified ceria particles were characterized by Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), field-emission scanning electron microscopy (FE-SEM), energy dispersive spectroscopy (EDS), laser particle size analyzer, zeta potential measurement and stability test, respectively. The results indicated that APS had been successfully grafted onto the surface of ceria nanoparticles, which led to the modified ceria nanoparticles with better dispersibility and stability than unmodified ceria particles in aqueous fluids. Then, CMP performance of the modified ceria nanoparticles on glass substrate was investigated. Experimental results showed that the modified ceria particles exhibited lower material removal rate (MRR) but much better surface quality than unmodified ceria particles, which may be explained by the hardness reduction of ceria particles, the enhancement of lubrication of the particles and substrate surfaces, and the elimination of the agglomeration among the ceria particles. (C) 2010 Elsevier B.V. All rights reserved.