Effects of plasma treatment on microstructure and electron field emission properties of screen-printed carbon nanotube films
Effects of plasma treatment on microstructure and electron field emission properties of screen-printed carbon nanotube films
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DOI：
10.1016/j.physe.2006.07.034
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发表时间：
2007-01-01
影响因子：
3.3
通讯作者：
Zou, Shichang
中科院分区：
文献类型：
--
作者：
Feng, Tao;Zhang, Jihua;Zou, Shichang
系统地研究了H-2、N-2和NH3等离子体处理对丝网印刷碳纳米管（CNT）薄膜的微观结构和场发射性能的影响。采用场发射扫描电镜（FESEM）、高分辨率透射电镜（HRTEM）和拉曼光谱对CNTs的微观结构变化进行了表征。结果表明：等离子体处理后，CNTs表面变得粗糙，表面出现大量纳米突起。实验表明，处理后的碳纳米管薄膜具有优异的FE性能，其发射位密度（ESD）从10(3)/cm(2)显著增加到10(6)/cm(2)。讨论了静电放电增强的机理和FE性能随处理时间的变化。(c) 2006年Elsevier B.V.出版
The effect of H-2, N-2 and NH3 plasma treatment on the microstructure and field emission (FE) properties of the screen-printed carbon nanotube (CNT) films has been systematically examined. Field emission scanning electron microscopy (FESEM), high-resolution transmission electron microscopy (HRTEM) and Raman spectroscopy were used to characterize the microstructural changes of the CNTs. The results indicated that the surface of CNTs became rough, and on which a lot of nano-protuberances appeared after plasma treatment. FE experiments showed the treated CNT films had superior FE behavior with emission site density (ESD) dramatically increasing from 10(3) to 10(6)/cm(2). The mechanism of ESD enhancement and variation of FE properties with treatment time have been discussed. (c) 2006 Published by Elsevier B.V.