SIMULATION OF LONGITUDINAL EMITTANCE CONTROL IN J-PARC RCS FOR 400 MEV INJECTION
SIMULATION OF LONGITUDINAL EMITTANCE CONTROL IN J-PARC RCS FOR 400 MEV INJECTION
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发表时间：
2010
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通讯作者：
M.Yamamoto;M.Nomura;A. Schnase;T. Shimada;F. Tamura
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作者：
M.Yamamoto;M.Nomura;A. Schnase;T. Shimada;F. Tamura
计划将J-PARC RCS的注入能量从181 MeV提升到400 MeV，这是实现设计光束强度所必需的。向磁共振注入高强度光束，通过优化RCS提取处的纵束发射度来缓解磁共振注入处的空间电荷效应。这是通过匹配RCS和mr之间的光束发射度形状来实现的，并描述了纵向发射度控制的粒子跟踪仿真结果。
The injection energy upgrade of the J-PARC RCS from 181 MeV to 400 MeV is scheduled, this is necessary to achieve the design beam intensity. The high intensity beam is delivered to the MR, and the space charge effect at the MR injection should be alleviated by optimizing the longitudinal beam emittance at RCS extraction. This is realized by matching the shape of the beam emittance between the RCS and the MR. We describe the results of particle tracking simulation with the longitudinal emittance control.