Plasma Profiles of Inductively Coupled Plasmas Sustained with Low‐Inductance Internal Antenna
Plasma Profiles of Inductively Coupled Plasmas Sustained with Low‐Inductance Internal Antenna
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低电感内部天线维持的电感耦合等离子体的等离子体分布
DOI：
10.1002/ppap.200732319
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发表时间：
2007
影响因子：
3.5
通讯作者：
Y. Setsuhara
中科院分区：
文献类型：
--
作者：
K. Takenaka;Takashi Sera;A. Ebe;Y. Setsuhara
我们研究了电感耦合等离子体（ICP）与一个单一的低电感天线（LIA）维持的等离子体密度，电子温度，和潜在的形成，以了解等离子体特性的影响，在产生区域（天线附近）和下游区域。用单个天线维持的等离子体密度在天线附近高达1012 cm−3，并且在远离单个天线约100 mm的下游区域具有几乎均匀的分布。通过降低天线RF电压有效抑制静电耦合，实现了低至5-6 V的浮动电位。等离子体密度分布与射频功率无关。
We have investigated plasma profiles of inductively coupled plasmas (ICPs) sustained with a single low-inductance antenna (LIA) in terms of plasma density, electron temperature, and potential formation to understand effects of plasma properties in generation region (near antenna) and those in downstream region. The densities of plasmas sustained with a single antenna were as high as 1012 cm−3 near the antenna and had almost uniform profiles in the downstream region away from the single antenna about 100 mm. The floating potential as low as 5–6 V was achieved by effective suppression of electrostatic coupling due to lowering antenna RF voltage. The plasma density profile was independent of RF power.