Direct Patterning of protein- and cell-resistant polymeric monolayers and microstructures
Direct Patterning of protein- and cell-resistant polymeric monolayers and microstructures
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DOI:
10.1002/adma.200305433
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发表时间:
2003-12-03
影响因子:
29.4
通讯作者:
Langer, R
中科院分区:
文献类型:
--
作者:
Khademhosseini, A;Jon, S;Langer, R
A simple techniqueis introduced to pattern proteins and cells with precise control over the feature topography (see Figure, white bar indicates 20 μm). The technique uses a combination of a molding process and a novel poly(ethylene glycol) copolymer to form topographical features ranging from polymeric monolayers to microstructures via simple modifications to the fabrication process.