Liquid / liquid ion-transfer processes at the dioctylphosphoric acid (N,N-didodecyl-N',N'-diethylphenylenediamine) / water (electrolyte) interface at graphite and mesoporous TiO2 substrates.

Liquid / liquid ion-transfer processes at the dioctylphosphoric acid (N,N-didodecyl-N',N'-diethylphenylenediamine) / water (electrolyte) interface at graphite and mesoporous TiO2 substrates.
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石墨和介孔 TiO2 基底上的二辛基磷酸(N,N-二十二烷基-N,N-二乙基苯二胺)/水(电解质)界面处的液体/液体离子转移过程。

DOI:
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发表时间:
2004
影响因子:
7.4
通讯作者:
M. Opallo
M. Opallo
中科院分区:
化学1区
文献类型:
--
作者:
Susan J. Stott;Katy J. McKenzie;R. Mortimer;C. Hayman;B. Buckley;Philip C Bulman Page;F. Marken;G. Shul;M. Opallo

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研究了双相电极体系对水不溶性液体N,N-双十二烷基-N ',N'-二乙基苯二胺(DDPD)的氧化反应,DDPD溶于二(2-乙基己基)磷酸盐(HDOP)中,并浸入水电解质介质中。在不存在HDOP的情况下的氧化过程伴随着阴离子(高氯酸盐或磷酸盐)从水中转移到有机相中。然而,在HDOP的存在下,氧化反而伴随着质子交换。这种电化学驱动的质子交换过程发生在很宽的pH范围内。DDPD在HDOP中的有机微滴沉积物在基面热解石墨电极上的伏安技术进行了研究,并在其行为中的有机微相沉积物中的介孔TiO 2薄膜进行了比较。介孔TiO 2薄膜作为有机液体的主体,并提供了一种替代的两相电极系统相比,随机微滴/石墨系统。研究了两种类型的介孔TiO 2薄膜电极,(i)ITO上的300-400-nm膜和(ii)ITO上的300-400-nm膜,其上涂覆有20-nm多孔金层。
Biphasic electrode systems are studied for the case of the oxidation of the water-insoluble liquid N,N-didodecyl-N',N'-diethylphenylenediamine (DDPD) neat and dissolved in bis(2-ethylhexyl) phosphate (HDOP) and immersed in aqueous electrolyte media. The oxidation process in the absence of HDOP is accompanied by transfer of the anion (perchlorate or phosphate) from the water into the organic phase. However, in the presence of HDOP, oxidation is accompanied by proton exchange instead. This electrochemically driven proton exchange process occurs over a wide pH range. Organic microdroplet deposits of DDPD in HDOP at basal plane pyrolytic graphite electrodes are studied by voltammetric techniques and compared in their behavior to organic microphase deposits in mesoporous TiO2 thin films. The mesoporous TiO2 thin film acts as a host for the organic liquid and provides an alternative biphasic electrode system compared to the random microdroplet/graphite system. Two types of mesoporous TiO2 thin-film electrodes, (i) a 300-400-nm film on ITO and (ii) a 300-400-nm film on ITO sputter-coated with a 20-nm porous gold layer, are investigated.