Surface dynamics on a high-temperature Si surface under a high-pressure reactive gas atmosphere studied by time-resolved UPS

Surface dynamics on a high-temperature Si surface under a high-pressure reactive gas atmosphere studied by time-resolved UPS
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通过时间分辨 UPS 研究高压反应气体气氛下高温硅表面的表面动力学

DOI:
10.1016/s0368-2048(98)00448-4
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发表时间:
1999
影响因子:
1.9
通讯作者:
Y. Takakuwa
Y. Takakuwa
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
Y. Takakuwa

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