Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitution
Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitution
复制标题
DOI：
10.1016/j.surfcoat.2014.06.037
复制
发表时间：
2014-09-15
影响因子：
5.4
通讯作者：
Konstantinidis, S.
中科院分区：
文献类型：
--
作者：
Cormier, P. -A.;Balhamri, A.;Konstantinidis, S.
在溅射沉积实验中，通过系统地改变工作条件，转移到基底的总能量通量在很宽的范围内变化。在反应性气氛中以直流磁控溅射（DCMS）或高功率脉冲磁控溅射（HiPIMS）模式溅射钛靶。使用不平衡的Cu（B）和平衡的（B）阴极，并且将输送到等离子体的时间平均功率设置为400或800 W。由于位于衬底位置处的热通量传感器，总能量通量被原位测量。首先，当氧气入口增加然后减少时，能通量表现出滞后。在第二步骤中，通过考虑每时间单位沉积的Ti原子的数量来计算归一化能通量（phi（norm）），并相应地比较放电状态。无论溅射方法如何，随着phi（norm）的增加，膜相构成从纯金红石演变为富含金红石的金红石/金红石相混合物。phi（norm）是UB-HiPIMS配置的最高值。令人惊讶的结果是，在800 W下与B-DCMS放电相关的能通量高于在相同功率下针对UB-DCMS测量的能通量。平衡阴极的增强的等离子体约束促进了靶表面的加热。由热表面发射的红外光子通量对总能量通量的贡献显著增加。从这个结果来看，在讨论薄膜最终特征时，似乎应该考虑到这种贡献。(C)2014爱思唯尔有限公司版权所有。
The total energy flux transferred to the substrate in sputter deposition experiments was varied in a broad range by modifying systematically the working conditions. A titanium target was sputtered in reactive atmosphere either in DC Magnetron Sputtering (DCMS) or in the High-Power Impulse Magnetron Sputtering (HiPIMS) mode. Unbalanced CUB) and balanced (B) cathodes were utilized and the time-averaged power delivered to the plasma was set to either 400 or 800W. The total energy flux was measured in situ thanks to a heat flux sensor located at the substrate position. First, the energy flux exhibits a hysteresis when the oxygen inlet is increased and then decreased. In a second step, the normalized energy flux (phi(norm)) was calculated by taking into account the number of Ti atoms deposited per time unit and the discharge regimes were compared accordingly. Regardless of the sputtering method, the film phase constitution evolves from pure anatase to rutile rich anatase/rutile phase mixtures as phi(norm) is increased. phi(norm) is the highest for UB-HiPIMS configuration. A surprising result is that the energy flux related to the B-DCMS discharge at 800W is higher than the one measured for the UB-DCMS, at the same power. The enhanced plasma confinement for the balanced cathode promotes the heating of the target surface. The contribution of the IR photon flux emitted by the hot surface to the total energy flux is significantly increased. From this result, it appears that this contribution should be taken into account when discussing thin film final features. (C) 2014 Elsevier B.V. All rights reserved.