Simulation study of material mixing process on tungsten surfaces at elevated temperatures due to boundary plasma exposure and its influence on plasma wall interactions

Simulation study of material mixing process on tungsten surfaces at elevated temperatures due to boundary plasma exposure and its influence on plasma wall interactions
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边界等离子体暴露导致钨表面高温材料混合过程的模拟研究及其对等离子体壁相互作用的影响

DOI:
10.1016/s0022-3115(02)01378-8
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发表时间:
2003
期刊:
影响因子:
--
通讯作者:
K. Ohya
K. Ohya
中科院分区:
--
文献类型:
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作者:
Retsuo Kawakami;K. Ohya

文献摘要

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使用动态等离子体-表面相互作用代码 EDDY,模拟了由于同时使用 W 和 C 作为面向等离子体的材料而导致的与材料混合相关的现象。将模拟结果与 TEXTOR-94 中测量的 W 表面 W-C 混合污染层的生长进行比较,结果显示出良好的一致性。该协议表明,这种生长是由于沉积的 C 杂质热扩散到 W 表面而造成的,具体取决于表面温度。此外,还模拟了 C+ 从 W-C 混合污染层渗透到等离子体中,以及化学侵蚀,包括等离子体中的 CD4 传输。模拟结果与在暴露于 TEXTOR-94 等离子体的 W-C 双测试限制器前测量的 CII 光发射分布进行了比较。这些比较表明,由于 W-C 混合污染层,化学侵蚀对 C 释放的贡献受到抑制。
Using a dynamic plasma–surface interaction code EDDY, phenomena associated with material mixing, which result from the simultaneous use of W and C as plasma-facing materials, have been simulated. A comparison of the simulation results with the growth of W–C mixed contamination layers at a W surface that was measured in TEXTOR-94 shows good agreement. The agreement shows that this growth is due to thermal diffusion of the deposited C impurity into the W surface, depending on the surface temperature. Also, C+penetration from the W–C mixed contamination layers into the plasma has been simulated along with chemical erosion including CD4transport in the plasma. The simulation results have been compared with CII light emission distributions measured in front of a W–C twin test limiter exposed to TEXTOR-94 plasmas. These comparisons show that the contribution of chemical erosion to the C release is suppressed due to the W–C mixed contamination layers.