Surface activated bonding of aluminum oxide films at room temperature
Surface activated bonding of aluminum oxide films at room temperature
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DOI:
10.1016/j.scriptamat.2020.09.005
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发表时间:
2021-01
影响因子:
6
通讯作者:
J. Utsumi;R. Takigawa
中科院分区:
文献类型:
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作者:
J. Utsumi;R. Takigawa
We have investigated the surface activated bonding (SAB) of deposited Al2O3films by chemical vapor deposition under a short-time activated condition at room temperature. Although the surface energy for bonding of Al2O3films was very low, that of Al2O3film/sapphire bonding was approximately 1 Jm−2and more than 2 Jm−2for sapphire/sapphire bonding. Transmission electron microscopy showed an amorphous-like intermediate layer approximately 1 nm thick, observed at the bonding interface of Al2O3/Al2O3, but not in the bonding of Al2O3/sapphire, which suggests that the crystallinity of the Al2O3film affects the bonding of Al2O3.