Spectroscopic diagnostic of an argon–hydrogen RF inductive thermal plasma torch at atmospheric pressure used for silicon hydrogenation
Spectroscopic diagnostic of an argon–hydrogen RF inductive thermal plasma torch at atmospheric pressure used for silicon hydrogenation
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用于硅氢化的大气压下氩-氢射频感应热等离子体炬的光谱诊断
DOI：
10.1088/0022-3727/35/18/309
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发表时间：
2002
期刊：
影响因子：
--
通讯作者：
J. Chapelle
中科院分区：
文献类型：
--
作者：
F. Bourg;S. Pellerin;D. Morvan;J. Amouroux;J. Chapelle
硅材料的氢化处理具有很大的光伏性能优势，是消除晶体玄武岩生长过程中晶体缺陷的关键。因此，用光学发射光谱方法来表征等离子体，以研究在Ar-H2混合物中感应热等离子体燃烧处理硅颗粒时的氢化作用是很有趣的。利用Balmer系列谱线的光学发射光谱检测了硅氢化过程中原子氢n' = 3-8的激发态。这些氢谱线被用来测定等离子体轴上的电子密度。此外，利用Ar - I线用玻尔兹曼图法估计了电子温度。对等离子体局部热力学平衡的偏差也进行了估计。
Hydrogenation of silicon materials has great advantages for its photovoltaic properties and is the key to elimination of crystalline defects during basaltic growth of the crystal. It is therefore interesting to characterize the plasma by optical emission spectroscopy methods in order to study hydrogenation of silicon particles during their treatment by an inductive thermal plasma burning in the Ar–H2 mixture. Excited states of atomic hydrogen n' = 3–8, which are responsible for silicon hydrogenation, have been detected by the optical emission spectroscopy of the Balmer series lines. These hydrogen lines have been used to determine electronic density on the plasma axis. Furthermore, Ar I lines were used to estimate the electronic temperature by the Boltzmann plot method. The deviation from the local thermodynamic equilibrium of the plasma has also been estimated.