Plasma treatment for crystallization of amorphous thin films
Plasma treatment for crystallization of amorphous thin films
复制标题
DOI:
10.1016/j.tsf.2005.07.244
复制
发表时间:
2006-04
期刊:
影响因子:
2.1
通讯作者:
H. Ohsaki;Y. Shibayama;A. Nakajim;A. Kinbara;Takashi Watanabe
中科院分区:
文献类型:
--
作者:
H. Ohsaki;Y. Shibayama;A. Nakajim;A. Kinbara;Takashi Watanabe