Development of a novel cathodic deposition method for thin-film metal azolate frameworks toward Cd2+ adsorption
Development of a novel cathodic deposition method for thin-film metal azolate frameworks toward Cd2+ adsorption
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DOI：
10.1016/j.jssc.2021.122177
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发表时间：
2021-07
影响因子：
3.3
通讯作者：
Jie Ding;Xiaoxuan Yuan;Jinfeng Wang;Wenfeng Mao;J. Huo;Jingbo Zhang
中科院分区：
文献类型：
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作者：
Jie Ding;Xiaoxuan Yuan;Jinfeng Wang;Wenfeng Mao;J. Huo;Jingbo Zhang
金属-有机骨架（MOFs）由于其大的比表面积、灵活的孔隙率和不饱和的配位键而受到人们的广泛关注。阴极沉积法是一种独特的原位电位驱动合成薄膜MOF的方法，但阴极沉积过程中反应物的逐渐消耗可能导致薄膜MOF沉积过程中反应的不稳定和不可控。在此，选择氧气作为形成OH-的初始反应物，这可以导致薄膜MAF-66（金属唑骨架-66）的逐渐和连续形成，并且MAF-66膜的粒径和膜厚度可以通过沉积时间容易地调节。阴极沉积薄膜MAF-66对重金属离子表现出良好的吸附性能，其中Cd 2+是吸附的代表物种。吸附容量可达32.3 mg/g（去除率为69%），制得的MAF-66膜具有良好的结构和形态稳定性，可达到令人满意的回收率。通过这种方法，开发了一种新型的、环境友好的、可控的阴极沉积方法来制备薄膜MAF-66，该薄膜MAF-66也显示出作为重金属离子吸附剂的巨大潜力。
Metal-Organic Frameworks (MOFs) have attracted much attention due to its large specific surface, flexible porosity and unsaturated coordination bonds. Cathodic deposition is a unique in-situ potential-driven synthesis method for the deposition of thin film MOFs; however, the gradually consumption of reactants during cathodic deposition might lead to unstable and uncontrollable reaction during thin-film MOF deposition. Herein, oxygen is selected as the initial reactant for the formation of OH−, which can result in gradually and successive formation of thin-film MAF-66 (Metal azolate framework-66), and the particle size and film thickness of the MAF-66 film can be easily tuned by the deposition time. Furthermore, the cathodic deposited thin-film MAF-66 show good adsorption property for heavy metal ions, with Cd2+as a representative species. The adsorption capacity can reach 32.3 mg/g (removal ratio: 69%) and the deposited MAF-66 film can achieve a satisfactory recovery degree with structural and morphological stability. In this way, a novel, environmental-friendly, and controllable cathode deposition method is developed for preparation of thin-film MAF-66, which also show great promise as a candidate for heavy metal ions adsorbent.