New High Current Low Energy Ion Source
New High Current Low Energy Ion Source
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新型高电流低能量离子源
DOI：
10.1116/1.583904
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发表时间：
1986
影响因子：
1.5
通讯作者：
S. Namba
中科院分区：
文献类型：
--
作者：
T. Hara;M. Hamagaki;A. Sanda;Y. Aoyagi;S. Namba
我们研制了一种用低能强流电子束激发的新型离子源。该离子源的可引出离子流密度高达0.62 A/cm ~ 2，加速电压低于60 V。该离子源将为无损离子刻蚀、离子束晶体生长和沉积等低能离子加工开辟一条新的途径。
We have developed a new type of ion source which is excited by a low energy and high current electron beam. The source has an extractable ion current density up to 0.62 A/cm2 and a low acceleration voltage less than 60 V. This ion source will open a new way for low energy ion processing like damageless ion etching, ion beam crystal growth and deposition.