The characteristics of structural and electrical properties of polycrystalline Al-doped ZnO films by direct current magnetron sputtering using ZnO-Al2O3 targets
The characteristics of structural and electrical properties of polycrystalline Al-doped ZnO films by direct current magnetron sputtering using ZnO-Al2O3 targets
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ZnO-Al2O3靶材直流磁控溅射多晶Al掺杂ZnO薄膜的结构和电学特性
DOI：
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发表时间：
2015
期刊：
影响因子：
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通讯作者：
Tetsuya Yamamoto
中科院分区：
文献类型：
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作者：
Junichi Nomoto;Hisao Makino;Tetsuya Yamamoto
