Calibration of Photomasks for Optical Coordinate Metrology
Calibration of Photomasks for Optical Coordinate Metrology
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光学坐标计量用光掩模的校准
DOI：
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发表时间：
2011
期刊：
影响因子：
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通讯作者：
F. Meli
中科院分区：
文献类型：
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作者：
F. Meli
光学坐标测量机（cmm）广泛应用于工业生产中对复杂部件的快速测量。根据ISO 10360-7，这些三坐标测量机的校准和验证需要经过认证的线刻度或网格板。此外，为了确定成像探头的探测误差，必须使用带有形式校准测试圆的掩模。利用METAS开发的光掩膜测量仪器和新的特定程序，不仅可以校准结构位置，还可以校准具有竞争不确定度的圆形结构的直径和圆度。
Optical coordinate measuring machines (CMMs) are widely used in industrial production for fast measurements on complex components. According to ISO 10360-7 the calibration and verification of these CMMs requires certified line scales or grid plates. Additionally, for the determination of the probing error of the imaging probe, masks with form calibrated test circles are compulsory. Using the photomask measuring instrument developed at METAS and using new specific procedures, it is possible to calibrate not only structure positions but also the diameter and roundness of circular structures with competitive uncertainties.