Elimination of Oxygen Defect in In-Si-O Film and Thin Film Transistor Performance

Elimination of Oxygen Defect in In-Si-O Film and Thin Film Transistor Performance
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In-Si-O薄膜中氧缺陷的消除及薄膜晶体管性能

DOI:
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发表时间:
2021
期刊:
影响因子:
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通讯作者:
E. K. Palupi and A. Fujiwara
E. K. Palupi and A. Fujiwara
中科院分区:
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文献类型:
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作者:
Ajendra Kumar VATS;Gaurav KAPIL;Shuzi HAYASE;Shyam S. PANDEY;秦涼佑,金澤有紘,青島貞人;E. K. Palupi and A. Fujiwara

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