Si<inline-formula><tex-math>$_{f 3}$</tex-math></inline-formula>N<inline-formula> <tex-math>$_{f 4}$</tex-math></inline-formula> Nanobeam Optomechanical Crystals
Si<inline-formula><tex-math>$_{f 3}$</tex-math></inline-formula>N<inline-formula> <tex-math>$_{f 4}$</tex-math></inline-formula> Nanobeam Optomechanical Crystals
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Si<内联公式><tex-math>$_{f 3}$</tex-math></inline-formula>N<内联公式> <tex-math>$_{f 4}$
DOI：
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发表时间：
2015
影响因子：
4.9
通讯作者：
K. Srinivasan
中科院分区：
文献类型：
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作者：
K. Grutter;M. Davanco;K. Srinivasan
综述了Si3N4纳米束光机械晶体的研究进展。这些结构由 350 nm 厚、700 nm 宽的双夹 Si3N4 纳米束组成，该纳米束周期性地形成一系列气孔阵列，并在其中引入缺陷区域。周期性图案同时创建 980 nm 带光子的光子带隙和 4 GHz 声子的声子带隙，缺陷区域用于将光学和机械模式共定位在各自的带隙内。这些光学和机械模式以耦合率 g0/2π≈100 kHz 色散地相互作用，这描述了由于机械模式的零点运动而导致的腔模光学频率的偏移。与机械模式相互作用产生的光学边带位于光学腔线宽之外，使得该系统可以在需要边带解析操作的应用中使用。除了对基本器件设计、制造和测量程序进行回顾之外，我们还通过优化光刻、HF 酸表面处理后的器件测量以及 6 至 300 K 之间机械阻尼的温度相关测量，提出了改进光学品质因数（高达 4 × 105）的新结果。测量到高达 ≈2.6 × 1013 Hz 的频率-机械品质因数乘积 (f × Qm)。
The development of Si3N4 nanobeam optomechanical crystals is reviewed. These structures consist of a 350-nm thick, 700-nm wide doubly-clamped Si3N4 nanobeam that is periodically patterned with an array of air holes to which a defect region is introduced. The periodic patterning simultaneously creates a photonic bandgap for 980 nm band photons and a phononic bandgap for 4 GHz phonons, with the defect region serving to colocalize optical and mechanical modes within their respective bandgaps. These optical and mechanical modes interact dispersively with a coupling rate g0/2π≈100 kHz, which describes the shift in cavity mode optical frequency due to the zero-point motion of the mechanical mode. Optical sidebands generated by interaction with the mechanical mode lie outside of the optical cavity linewidth, enabling possible use of this system in applications requiring sideband-resolved operation. Along with a review of the basic device design, fabrication, and measurement procedures, we present new results on improved optical quality factors (up to 4 × 105) through optimized lithography, measurements of devices after HF acid surface treatment, and temperature dependent measurements of mechanical damping between 6 and 300 K. A frequency-mechanical quality factor product (f × Qm) as high as ≈2.6 × 1013 Hz is measured.