Deoxygenation of Graphene Oxide: Reduction or Cleaning?
Deoxygenation of Graphene Oxide: Reduction or Cleaning?
复制标题
DOI：
10.1021/cm401922e
复制
发表时间：
2013-09-24
影响因子：
8.6
通讯作者：
Rourke, Jonathan P.
中科院分区：
文献类型：
--
作者：
Thomas, Helen R.;Day, Stephen P.;Rourke, Jonathan P.
我们表明，氧化石墨烯（GO）的双组分模型，即由高度氧化的碳质碎片与氧官能化的石墨烯片复合组成，是GO合成的一般特征，与所使用的氧化剂或协议无关。存在的碎片，按质量计约为三分之一，可以通过碱洗去除。包括固态NMR在内的许多技术证明，碱洗材料的性质与所用碱无关，并且它含有与碎片中存在的官能团相似的官能团，但浓度较低。氧化碎片的去除清洁了GO，揭示了其真正的单层性质，并且在该过程中增加了C/O比（即，脱氧）。相比之下，用肼处理GO既去除了碎片又减少了石墨烯片（均脱氧）。
We show that the two-component model of graphene oxide (GO), that is, composed of highly oxidized carbonaceous debris complexed to oxygen functionalized graphene sheets, is a generic feature of the synthesis of GO, independent of oxidant or protocol used. The debris present, roughly onethird by mass, can be removed by a base wash. A number of techniques, including solid state NMR, demonstrate that the properties of the base-washed material are independent of the base used and that it contains similar functional groups to those present in the debris but at a lower concentration. Removal of the oxidation debris cleans the GO, revealing its true monolayer nature and in the process increases the C/O ratio (i.e., a deoxygenation). By contrast, treating GO with hydrazine both removes the debris and reduces (both deoxygenations) the graphene sheets.