Simulation of Low-Pressure Capacitively Coupled Plasmas Combining a Parallelized Particle-in-Cell Simulation and Direct Simulation of Monte Carlo
Simulation of Low-Pressure Capacitively Coupled Plasmas Combining a Parallelized Particle-in-Cell Simulation and Direct Simulation of Monte Carlo
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DOI：
10.1109/tps.2014.2368145
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发表时间：
2014-11
影响因子：
1.5
通讯作者：
Jin Seok Kim;M. Hur;I. Song;H. Lee;Hae June Lee
中科院分区：
文献类型：
--
作者：
Jin Seok Kim;M. Hur;I. Song;H. Lee;Hae June Lee
并行粒子在单元（PIC）模拟和蒙特卡罗直接模拟（DSMC）相结合来模拟低压放电。与图形处理单元并行的二维 (2-D) PIC 仿真用于检查电容耦合等离子体装置在压力 <; 时的放电特性。 10 mTorr，而 DSMC 方法用于计算中性分布而不是流体模型。中性分布曲线将作为初始条件转移到 PIC 仿真中。在低气压下，中性密度分布表现出不均匀的特性，这也改变了等离子体均匀性的模拟结果。总体而言，包含准确的中性密度剖面对于获得与实验结果可比较的精确模拟结果至关重要。
A parallelized particle-in-cell (PIC) simulation and direct simulation of Monte Carlo (DSMC) are combined to simulate low-pressure discharges. A two-dimensional (2-D) PIC simulation parallelized with graphics processing units is used to examine the discharge characteristics of a capacitively coupled plasma device at pressures <; 10 mTorr, whereas a DSMC method is used to calculate the neutral distribution instead of a fluid model. The neutral distribution profile is transferred to the PIC simulation as the initial condition. At low gas pressures, the neutral density profile shows nonuniform properties, which also changes the simulation results of plasma uniformity. Overall, the inclusion of an accurate neutral density profile is essential for obtaining exact simulation results that are comparable with the experimental results.