Microstructure and magnetic properties of FeCoN thin films
Microstructure and magnetic properties of FeCoN thin films
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DOI：
10.1063/1.367930
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发表时间：
1998-10
影响因子：
3.2
通讯作者：
P. Kuo;S. Chang;C. Kuo;Y. Yao;H. L. Huang
中科院分区：
文献类型：
--
作者：
P. Kuo;S. Chang;C. Kuo;Y. Yao;H. L. Huang
研究了氮含量和衬底温度对FeCoN薄膜微观结构和磁性能的影响。根据TEM和x射线Scherrer’s方程分析，我们发现衬底温度低于200℃时，薄膜的晶粒尺寸大致为13 nm左右，而衬底温度高于300℃时，薄膜的晶粒尺寸增长非常快。薄膜中的氮含量饱和至30at。%，当N2流量比N2/(Ar+N2)大于5 vol. %时。从磁化研究中，我们发现最佳样品（衬底温度接近200℃）的饱和磁化强度4πMs为23.9 kG。α-Fe与N结合形成了高磁矩的FeN相，从而提高了材料的磁性能。
Effects of nitrogen contents and substrate temperatures to the microstructure and magnetic properties of the FeCoN films have been investigated. According to the TEM and x-ray Scherrer’s equation analyses, we found that the grain size of films with substrate temperature below 200 °C is roughly about 13 nm, however, it increases very fast for films with substrate temperature above 300 °C. N content in the films is saturated to 30 at. %, as N2 flow ratio N2/(Ar+N2) is higher than 5 vol. %. From the magnetization studies, we have found that the saturation magnetization 4πMs of the optimum samples (with the substrate temperature near 200 °C) is 23.9 kG. The improvement of the magnetic properties is attributed to the combination of α-Fe with N to form the high magnetic moment FeN phases.