Rapid thermal processing of self-assembling block copolymer thin films
Rapid thermal processing of self-assembling block copolymer thin films
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DOI：
10.1088/0957-4484/24/31/315601
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发表时间：
2013-08-09
期刊：
影响因子：
3.5
通讯作者：
Perego, M.
中科院分区：
文献类型：
--
作者：
Ferrarese Lupi, F.;Giammaria, T. J.;Perego, M.
自组装嵌段共聚物产生了纳米结构的图案，这在广泛的应用中是有用的。在本文中，我们展示了通过在快速热处理机中进行快速热处理来控制PS-b-PMMA两嵌段共聚物薄膜在未图案化表面上自组装过程的形态的能力。该方法包括使用放射源，以便快速驱动聚合物膜高于玻璃化转变温度。在不超过60 S的条件下，得到了垂直取向的柱状和片状PS-b-PMMA嵌段共聚物的高度有序图样。这种方法提供了前所未有的机会来详细研究嵌段共聚物在过程的早期阶段的自组装动力学，为更深入地理解支配这些过程的化学和物理现象提供了更深入的理解。
Self-assembling block copolymers generate nanostructured patterns which are useful for a wide range of applications. In this paper we demonstrate the capability to control the morphology of the self-assembling process of PS-b-PMMA diblock copolymer thin films on unpatterned surfaces by means of fast thermal treatment performed in a rapid thermal processing machine. The methodology involves the use of radiation sources in order to rapidly drive the polymeric film above the glass transition temperature. Highly ordered patterns were obtained for perpendicular-oriented cylindrical and lamellar PS-b-PMMA block copolymers in less than 60 s. This approach offers the unprecedented opportunity to investigate in detail the kinetics of the block copolymer self-assembly during the early stages of the process, providing a much deeper understanding of the chemical and physical phenomena governing these processes.