Enhanced surface hardness of flexible polycarbonate substrates using plasma-polymerized organosilicon oxynitride films by air plasma jet under atmospheric pressure
Enhanced surface hardness of flexible polycarbonate substrates using plasma-polymerized organosilicon oxynitride films by air plasma jet under atmospheric pressure
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DOI：
10.1016/j.surfcoat.2011.01.060
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发表时间：
2011-03-25
影响因子：
5.4
通讯作者：
Huang, Charming
中科院分区：
文献类型：
--
作者：
Lin, Yung-Sen;Weng, Mao-Syuan;Huang, Charming
研究人员利用大气压等离子体射流 (APPJ) 在不同基板距离上高速沉积（类似于 19.1-19.9 nm/s）等离子体聚合有机硅氮氧化物 (SiOxCyNz) 薄膜，以提高柔性聚碳酸酯 (PC) 基板的表面硬度。研究发现，通过在大气压下将前体四甲基二硅氧烷（TMDSO）注入空气等离子体射流中，可以在室温（23℃）下将透明、坚硬且柔性的SiOxCyNz薄膜沉积到PC基板上。铅笔硬度测量（ASTM D-3363）表明，PC 基材的表面硬度从未涂层 PC 基材的 3B 软表面到 SiOxCyNz 薄膜涂层 PC 基材的 7H 硬表面大大提高。本研究表明，PC 基材的表面硬度性能高度依赖于 PC 基材的表面特性。通过原子力显微镜（AFM）和场发射扫描电子显微镜（FESEM）观察PC基板的表面形貌。使用 X 射线光电子能谱 (XPS) 和傅里叶变换红外光谱 (FTIR) 分析 APPJ 合成的 SiOxCyNz 薄膜的原子组成和化学键。 (C) 2011 Elsevier B.V. 保留所有权利。
An investigation is conducted on the enhanced surface hardness of flexible polycarbonate (PC) substrates using high-rate deposition (similar to 19.1-19.9 nm/s) of plasma-polymerized organosilicon oxynitride (SiOxCyNz) films with an atmospheric pressure plasma jet (APPJ) at various substrate distances. It is found that the transparent, hard and flexible SiOxCyNz films can be deposited onto PC substrates at room temperature (23 degrees C) by injection of precursor tetramethyldisiloxan (TMDSO) into air plasma jet at atmospheric pressure. Pencil hardness measurements (ASTM D-3363) demonstrate that the surface hardness of the PC substrate is greatly enhanced from a soft surface of 3B for un-coated PC substrate to a hard surface of 7H for SiOxCyNz film-coated PC substrate. This study indicates that the performance of surface hardness on PC substrates is highly dependent on the surface characteristics of the PC substrates. The surface morphology of the PC substrate is observed by atomic force microscopy (AFM) and field emission scanning electron microscopy (FESEM). The atomic compositions and chemical bonds of APPJ-synthesized SiOxCyNz films are analyzed using X-ray photoelectron spectroscopy (XPS) and Fourier transformed infrared spectroscopy (FTIR). (C) 2011 Elsevier B.V. All rights reserved.