NANO-FLOW THERMAL SENSOR APPLYING DYNAMIC ω-2ω SENSING METHOD
NANO-FLOW THERMAL SENSOR APPLYING DYNAMIC ω-2ω SENSING METHOD
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发表时间：
2006
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通讯作者：
Marcel Dijkstra;T. Lammerink;R. Wiegerink;M. Elwenspoek
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作者：
Marcel Dijkstra;T. Lammerink;R. Wiegerink;M. Elwenspoek
本文介绍了使用标准微机械加工技术制造的微通道热流量传感器。传感器包括通过蚀刻多晶硅牺牲层而产生的SiXNY微通道。通道通过KOH蚀刻通过从衬底的背面蚀刻的入口和出口释放。通过沉积在微通道顶部的铂电阻测量液体流量，同时通过SiXNY膜将通道与基板热隔离。已经使用施加热波的动态感测方法测量了nl/min量级的DI水的流速。
⎯ This article presents microchannel thermal flow sensors fabricated using standard micromachining technology. The sensors comprise of a SiXNY microchannel created by etching of a poly-Si sacrificial layer. The channels are released by KOH etching through inlets and outlets etched from the backside of the substrate. Liquid flow is measured by platinum resistors deposited on top of the microchannel, while the channel is thermally isolated from the substrate by a SiXNY membrane. Flow rates of DI water in the order of nl⋅min have been measured using a dynamic sensing method applying heat waves.