Vector control of induced magnetic anisotropy using an in situ quadrupole electromagnet in ultrahigh vacuum sputtering.
Vector control of induced magnetic anisotropy using an in situ quadrupole electromagnet in ultrahigh vacuum sputtering.
复制标题
超高真空溅射中使用原位四极电磁体感应磁各向异性的矢量控制。
DOI：
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发表时间：
2012
影响因子：
1.6
通讯作者：
W. Bailey
中科院分区：
文献类型：
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作者：
Cheng Cheng;N. Sturcken;K. Shepard;W. Bailey
我们展示了在超高真空溅射系统中加入四极电磁铁来矢量控制磁性薄膜异质结中的感应磁各向异性。利用静止的四极电磁铁产生磁场，在溅射过程中，磁场与衬底的物理轴同步旋转。通过调整衬底的相位差和场旋转，可以为连续的铁磁层设置任意的各向异性方向。在沉积过程中旋转衬底并在不破坏真空的情况下改变各向异性的能力使得能够沉积具有任意面内各向异性轴的软磁异质结构。
We demonstrate the incorporation of a quadrupole electromagnet into an ultrahigh vacuum sputtering system for the vector control of induced magnetic anisotropy in magnetic thin-film heterostructures. A stationary quadrupole electromagnet is used to generate a magnetic field, which rotates synchronously with the physical axes of the substrate in situ during sputtering. An arbitrary anisotropy direction can be set for successive ferromagnetic layers by adjusting the phase difference of substrate and field rotation. The ability to rotate the substrate during deposition and change anisotropy without breaking vacuum enables the deposition of magnetically soft heterostructures with arbitrary in-plane anisotropy axes.