Lithography with UV-LED array for curved surface structure
Lithography with UV-LED array for curved surface structure
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DOI：
10.1007/s00542-007-0544-5
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发表时间：
2008-08
期刊：
影响因子：
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通讯作者：
S. Suzuki;Y. Matsumoto
中科院分区：
文献类型：
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作者：
S. Suzuki;Y. Matsumoto
为了实现微透镜、导光元件等光学元件的制造，需要高深宽比的微曲面结构的制造技术，本研究中，使用UV-LED阵列和旋转台的新型光刻技术来制造微曲面结构（Hanai等，Proceedings of the 22 nd sensor symposium，pp 516-519，2005）。由于UV-LED的宽方向性特性使紫外辐射剂量产生差异，该技术可以制作出光滑的表面结构。此外，由于旋转减少了曝光的不均匀性，因此可以仅通过一次曝光工艺在大面积中以高均匀性形成结构。该技术可以通过改变曝光时间和应用灰度掩模方法来控制结构的形状（Waits等人，Sensors Actuat A 119：245-253，2005）。我们利用这种技术制作了半球形、半圆柱形和半圆锥形结构。获得了高纵横比的结构，它们具有光滑的曲面。然后，它们被用于微透镜制造。利用模压成型技术，在硅片上制作了紫外光固化树脂微透镜。
The technology to fabricate high-aspect ratio and micro curved surface structures is needed for optical device fabrication such as micro lens, light guiding device, and so on. In this study, micro curved surface structures were fabricated by using novel lithography technique with UV-LED array and rotary stage (Hanai et al. in Proceedings of the 22nd sensor symposium, pp 516–519, 2005). Smooth surface structures can be fabricated in this technique, because UV-LED which has wide directivity characteristics makes the difference of the UV dose. In addition, the structures can be formed with high uniformity in large area by only one exposure process, because rotation reduces the unevenness of exposure. This technique can control the shapes of structures by changing exposure time and applying gray scale mask method (Waits et al. in Sensors Actuat A 119:245–253, 2005). We fabricated structures of hemisphere, semi-cylinder, and semi-cone by using this technique. High-aspect ratio structures were obtained and they had smooth curved surface. Then, they were used for micro lens fabrication. By using molding technique, micro lenses of the UV curable resin were fabricated on the silicon wafer.