CHARACTERIZATION OF BORON-NITRIDE FILMS DEPOSITED FROM BCL3-NH3-H-2 MIXTURES IN CHEMICAL-VAPOR INFILTRATION CONDITIONS
CHARACTERIZATION OF BORON-NITRIDE FILMS DEPOSITED FROM BCL3-NH3-H-2 MIXTURES IN CHEMICAL-VAPOR INFILTRATION CONDITIONS
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DOI：
10.1007/bf00368905
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发表时间：
1994-03-15
影响因子：
4.5
通讯作者：
ERRE, R
中科院分区：
文献类型：
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作者：
CHOLET, V;VANDENBULCKE, L;ERRE, R
采用BCl_3-NH_3-N-2混合气体，通过等压和等温化学气相渗透（ICVI）方法制备了氮化硼（BN）薄膜，并从物理化学的角度对沉积条件和水分的失稳作用进行了表征。在773 K下沉积并在1273 K下后处理的BN薄膜是乱层结构的（d（002）=0.36 nm，L（c）=1.5 nm），具有低密度（1.4 g cm（-3））并含有氧（约20 at %）。第一氧含量（XPS为191.5 eV）在CVI步骤期间相对于中间固体产物的吸湿性以及BN和B2 O3的形成之间的准平衡插入膜中。第二个氧含量（192.5 eV）是由于水分引起BN的水解，这引起了BN的非常剧烈的转变。这种去稳定作用影响硼和氮原子，并导致硼酸铵水合物的形成。不同的后处理已被研究，以稳定的BN膜，它似乎在氨下氮化是最有效的。
Boron nitride (BN) thin films deposited by isopressure and isothermal chemical vapour infiltration (ICVI) from BCl3-NH3-N-2 mixtures have been characterized from a physicochemical point of view as functions of both the deposition conditions and the destabilizing action of moisture. As-deposited (deposited at 773 K and post-treated at 1273 K), the BN films are turbostractic (d(002)=0.36 nm, L(c)=1.5 nm), have a low density (1.4 g cm(-3)) and contain oxygen (about 20 at %). A first oxygen content (191.5 eV by XPS) is inserted in the films during the CVI step in relation to the hygroscopy of intermediate solid products and the quasi-equilibrium between the formation of BN and B2O3. A second oxygen content (192.5 eV) is due to the hydrolysis of BN by moisture which induces a very drastic transformation of BN. This destabilization affects both boron and nitrogen atoms and leads to the formation of ammonium berate hydrates. Different post-treatments have been investigated to stabilize the BN films and it appears that nitriding under ammonia is the most efficient.