Using Bottom-Up Lithography and Optical Nonlocality to Create Short-Wave Infrared Plasmonic Resonances in Graphene
Using Bottom-Up Lithography and Optical Nonlocality to Create Short-Wave Infrared Plasmonic Resonances in Graphene
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DOI：
10.1021/acsphotonics.1c00149
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发表时间：
2021-04
期刊：
影响因子：
7
通讯作者：
Joel. F. Siegel;Jonathan H. Dwyer;Anjali Suresh;N. Safron;Margaret Fortman;C. Wan;Jonathan W. Choi;Wei Wei-Wei;V. Saraswat;Wyatt A. Behn;M. Kats;M. Arnold;P. Gopalan;V. Brar
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文献类型：
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作者：
Joel. F. Siegel;Jonathan H. Dwyer;Anjali Suresh;N. Safron;Margaret Fortman;C. Wan;Jonathan W. Choi;Wei Wei-Wei;V. Saraswat;Wyatt A. Behn;M. Kats;M. Arnold;P. Gopalan;V. Brar
石墨烯等离子体谐振器由于其电可调谐和大的限制因子，在太赫兹和中红外范围内得到了广泛的研究，这使得石墨烯等离子体谐振器能够在太赫兹和中红外范围内产生戏剧性的激光输出。
Graphene plasmonic resonators have been broadly studied in the terahertz and mid-infrared ranges because of their electrical tunability and large confinement factors, which can enable the dramatic ...