Characterization of Ta and TaN diffusion barriers beneath Cu layers using picosecond ultrasonics

Characterization of Ta and TaN diffusion barriers beneath Cu layers using picosecond ultrasonics
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DOI:
10.1016/j.ultras.2006.05.097
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发表时间:
2006-12-22
期刊:
影响因子:
4.2
通讯作者:
Dual, Juerg
Dual, Juerg
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
Bryner, Juerg;Profunser, Dieter M.;Dual, Juerg

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