Self-Accommodation Morphology in Ti-Nb-Al Shape Memory Alloy
Self-Accommodation Morphology in Ti-Nb-Al Shape Memory Alloy
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DOI：
10.4028/www.scientific.net/msf.654-656.2154
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发表时间：
2010-06
期刊：
影响因子：
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通讯作者：
T. Inamura;H. Hosoda;H. Kanetaka;H. Y. Kim;S. Miyazaki
中科院分区：
文献类型：
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作者：
T. Inamura;H. Hosoda;H. Kanetaka;H. Y. Kim;S. Miyazaki
通过传统透射电子显微镜（CTEM）观察研究了钛形状记忆合金（SMA）的自调节微观结构。自调节微观结构有两个不同的最小单位。其中一个是由两个习惯平面变体组成的 V 形对，如之前的一些研究报告所述，它们以 I 型孪生为界。{111}另一个是由 II 型双胞胎界定的两个习惯平面变体的捆绑。后者尚未被认为是 -钛 SMA 中的自调节微观结构。
The self-accommodation microstructure of a -titanium shape memory alloy (SMA) was investigated by conventional transmission electron microscopy (CTEM) observation. There were two distinct minimum units for the self-accommodation microstructure. One was the V-shaped pair of two habit plane variants that were bounded by the {111}TypeI twin as reported in some previous studies. The other was the bundle of the two habit plane variants that were bounded by the TypeII twin. The later one had not been recognized as the self-accommodation microstructure in -titanium SMAs.