MAGNETIC-PROPERTIES OF SPUTTERED FE THIN-FILMS - PROCESSING AND THICKNESS DEPENDENCE
MAGNETIC-PROPERTIES OF SPUTTERED FE THIN-FILMS - PROCESSING AND THICKNESS DEPENDENCE
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DOI：
10.1063/1.354926
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发表时间：
1993-07-15
影响因子：
3.2
通讯作者：
OLIVERIA, M
中科院分区：
文献类型：
--
作者：
KIM, YK;OLIVERIA, M
本文研究了厚度为200-1000埃的多晶铁膜的微结构和磁性能。采用射频溅射法在SiO_2衬底上制备了薄膜。这项调查是由于缺乏关于这种厚度范围内的溅射铁膜的数据，以及关于蒸发薄膜的数据不一致而引起的。除了厚度外，还改变了衬底温度和沉积压力，以考察它们对微结构的影响。用X射线衍射仪、透射电子显微镜和俄歇能谱对薄膜的微观结构进行了表征。多晶薄膜没有表现出强烈的择优取向，平均晶粒尺寸为60-85埃。暴露在空气中形成的表面氧化层从10埃到80埃不等，较厚的氧化物形成在密度较低的薄膜上。利用振动样品磁强计进行了磁滞回线测量。在1000埃以下，孔洞和表面氧化导致饱和磁化强度降低高达15%。在300-500埃的薄膜厚度范围内观察到了一个反常的矫顽力峰值，这可以用磁畴壁类型的变化来解释。
The microstructure and magnetic properties of polycrystalline Fe films with thicknesses of 200-1000 angstrom have been investigated. The films were prepared by rf sputtering onto SiO2 substrates. The investigation was prompted by the lack of data on sputtered Fe films in this thickness regime as well as disagreement in the data for evaporated films. In addition to thickness, substrate temperature and deposition pressure were varied to examine their effect on the microstructure. The film microstructure was characterized by x-ray diffraction, transmission electron microscopy, and Auger spectroscopy. The polycrystalline films did not display a strong preferred orientation and had average grain sizes of 60-85 angstrom. Surface oxide layers formed upon exposure to air ranged from 10 to 80 angstrom, the thicker oxides formed on films with lower density. Magnetic hysteresis measurements were made with a vibrating sample magnetometer. Below 1000 angstrom, porosity and surface oxidation result in reductions up to 15% in the saturation magnetization. An anomalous peak in coercivity at film thicknesses of 300-500 angstrom was observed, which can be explained by the change in domain wall type.