Clonal diversity and genetic differentiation in Ilex leucoclada M. patches in an old‐growth beech forest
Clonal diversity and genetic differentiation in Ilex leucoclada M. patches in an old‐growth beech forest
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DOI：
10.1046/j.1365-294x.2003.01798.x
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发表时间：
2003-04
影响因子：
4.9
通讯作者：
T. Torimaru;N. Tomaru;N. Nishimura;S. Yamamoto
中科院分区：
文献类型：
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作者：
T. Torimaru;N. Tomaru;N. Nishimura;S. Yamamoto
利用随机扩增多态性DNA （RAPD）标记，研究了白绿冬青（Ilex leucoclada）斑块内的克隆多样性以及斑块内和斑块间的遗传变异。我们发现有38个斑块在地块中部呈块状分布。我们从完全在地块内的27个斑块中取样的215个茎中共鉴定出166种RAPD表型。种群在斑块内表现出较高的克隆多样性（平均基因数相对于茎数= 0.79，平均Simpson’s D= 0.89）。斑块间RAPD表型差异极显著（分子方差分析ΦST = 0.316, P < 0.001），表明斑块间存在遗传分化。斑块间的成对遗传距离ΦST与斑块间的地理距离无关。基于遗传距离的聚类分析表明，斑块之间没有明显的空间遗传结构。斑块内和群体内克隆多样性的高水平可能由多个奠基人、斑块形成过程中的幼苗招募和体细胞突变来解释。斑块间显著的遗传分化可能是由不同的形成事件和/或斑块内亲缘结构引起的。
We investigated clonal diversity within patches of Ilex leucoclada and genetic variation within and among patches using random amplified polymorphic DNA (RAPD) markers in a 1‐ha plot within an old‐growth beech forest. We found 38 patches that exhibited a clumped distribution in the middle of the plot. We identified a total of 166 RAPD phenotypes among the 215 stems sampled from 27 patches that were completely within the plot. The population showed high clonal diversity within patches (mean number of genets relative to number of stems = 0.79; mean Simpson's D= 0.89). Variation in RAPD phenotypes among patches was highly significant (ΦST in the molecular variance analysis = 0.316, P < 0.001), indicating genetic differentiation among patches. Pairwise genetic distances, ΦST, among patches did not correlate with geographical distances among patches. The cluster analysis based on the genetic distances showed few clear clusters of patches, indicating no spatial genetic structure among patches. High levels of clonal diversity both within patches and within the population may be explained by multiple founders, seedling recruitment during patch‐formation, and somatic mutation. The significant genetic differentiation among patches may be caused by separate founding events and/or kin structuring within patches.