Fabrication of arrays of two-dimensional micropatterns using microspheres as lenses for projection photolithography
Fabrication of arrays of two-dimensional micropatterns using microspheres as lenses for projection photolithography
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DOI：
10.1063/1.1351525
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发表时间：
2001-04-15
影响因子：
4
通讯作者：
Whitesides, GM
中科院分区：
文献类型：
--
作者：
Wu, MH;Whitesides, GM
这封信演示了一组透明微球在光刻胶中形成重复的微米级图案的使用，从具有厘米级图案的掩模开始。一个直径为1.5 μ m的透明微球作为透镜，在其像面上将厘米尺度的图像缩小为微米尺度的图像。我们制备了聚苯乙烯微球阵列（d = 1.5-10 μ m），嵌入透明膜中，在光刻胶中产生重复的图案，并通过发射将所得图案转移到金属薄膜上。该技术的光学系统与传统投影光刻中使用的光学系统有关，但不同之处在于，实现尺寸缩小的透镜位于光刻胶的10微米范围内。微球在大约2厘米的面积上产生均匀的图案，使用面积为25 X 25厘米的掩模，用白光光源照射。该方法可以在微图案内或相邻图案之间生成亚微米特征。(C) 2001年美国物理研究所。
This letter demonstrates the use of an array of transparent microspheres in forming repetitive, micrometer-scale patterns in photoresist, starting from masks with centimeter-scale patterns. A transparent microsphere with diameter d > 1.5 mum acts as a lens and reduces centimeter-scale images into micrometer-scale images on its image plane. A planar array of microspheres projects the image of an illuminated mask onto a corresponding array of micropatterns on their common image plane, We have prepared arrays of polystyrene microspheres (d = 1.5-10 mum) embedded in a transparent membrane to generate repetitive patterns in photoresist, and have transferred the resulting patterns into metal films by liftoff. The optical system of this technique is related to that used in conventional projection photolithography, but differs in that the lens that accomplishes size reduction is positioned within 10 mum of the photoresist. The microspheres generate uniform patterns over an area of similar to2 cm(2), using a mask with area similar to 25 X 25 cm(2) illuminated with a white light sourer. This method can generate submicron features either within a micropattern or between neighboring patterns. (C) 2001 American Institute of Physics.