Adsorption by design: Tuning atom-graphene van der Waals interactions via mechanical strain
Adsorption by design: Tuning atom-graphene van der Waals interactions via mechanical strain
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设计吸附：通过机械应变调节原子-石墨烯范德华相互作用
DOI：
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发表时间：
2016
期刊：
影响因子：
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通讯作者：
V. Kotov
中科院分区：
文献类型：
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作者：
Nathan S. Nichols;A. Maestro;C. Wexler;V. Kotov
我们的目的是了解中性原子和石墨烯层之间的范德华力是如何被单轴应变和电子相关效应所改变的。详细分析了三个原子（He， H和Na）和石墨烯应变范围从弱到中等强。我们证明了范德瓦尔斯势可以通过应变显着增强，并介绍了我们的结果在石墨烯原子弹性散射问题上的应用。特别地，我们发现量子反射可以被应变显著地抑制，这意味着表面附近的耗散非弹性效应变得越来越重要。此外，我们还介绍了一种方法来独立估计用于He与石墨烯相互作用的有效模型中的Lennard-Jones参数，并确定它们如何依赖于应变。在短距离时，我们发现应变倾向于通过将吸附势最小值的位置推到变形石墨烯片上方的更高距离来降低相互作用强度。这为机械工程处理吸附势开辟了令人兴奋的可能性，并对各向异性低维超流体相的形成和观察产生了影响。
We aim to understand how the van der Waals force between neutral adatoms and a graphene layer is modified by uniaxial strain and electron correlation effects. A detailed analysis is presented for three atoms (He, H, and Na) and graphene strain ranging from weak to moderately strong. We show that the van der Waals potential can be significantly enhanced by strain, and present applications of our results to the problem of elastic scattering of atoms from graphene. In particular we find that quantum reflection can be significantly suppressed by strain, meaning that dissipative inelastic effects near the surface become of increased importance. Furthermore we introduce a method to independently estimate the Lennard-Jones parameters used in an effective model of He interacting with graphene, and determine how they depend on strain. At short distances, we find that strain tends to reduce the interaction strength by pushing the location of the adsorption potential minima to higher distances above the deformed graphene sheet. This opens up the exciting possibility of mechanically engineering an adsorption potential, with implications for the formation and observation of anisotropic low dimensional superfluid phases.