Synthesis and boosting visible light photoactivity of Ag@AgI/CdWO4 towards refractory organic pollutants degradation based on interfacial charge transfer
Synthesis and boosting visible light photoactivity of Ag@AgI/CdWO4 towards refractory organic pollutants degradation based on interfacial charge transfer
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基于界面电荷转移的Ag@AgI/CdWO4的合成和增强可见光光活性以降解难降解的有机污染物
DOI:
10.1016/j.apsusc.2018.05.163
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发表时间:
2018-10
影响因子:
6.7
通讯作者:
Mo Dan
中科院分区:
文献类型:
--
作者:
Yuan Xingzhong;Wu Zhibin;Zeng Guangming;Jiang Longbo;Zhang Jin;Xiong Ting;Wang Hou;Mo Dan
The high visible light active photocatalysts of Ag@AgI/CdWO4(AICW) were synthesized via in situ deposition–precipitation and photoreduction methods. The physicochemical properties of crystal phases, morphologies, chemical compositions, optical properties and so on were characterized via several techniques. The results shown that the interface interaction between CdWO4(CW) nanorods and Ag@AgI (AI) particles would enhance the visible light trapping, improve the surface area, promote the separation and transfer of photogenerated charge carrier and prolong the photoelectron lifetime. The AICW–3 with considerable reusability exhibited the optimum synergism of visible light photoactivity towards rhodamine B (RhB) and tetracycline (TC) degradation, in which the RhB and TC degradation ratio is 99.3% (24 min) and 77.0% (20 min), respectively, and the photocatalytic rate is 2.43 and 2.61 times that of AI, respectively. Furthermore, the free radical capture and electron spin resonance (ESR) experiments indicated that theradical dotO2−, h+andradical dotOH species were the main radicals for RhB and TC degradation. Accordingly, the possible mechanisms of transfer and separation of photoinduced carriers as well as the generation of radicals for RhB and TC decomposition under visible light irradiation were proposed to lead the further improvement in environment remediation.
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影响因子:
3.3
作者:
通讯作者:
--
DOI:
--
发表时间:
--
期刊:
J. Am. Chem. Soc.
影响因子:
--
作者:
Zhou Xuefeng;He Hong;Qu Jiuhui;Nie Yulun;Hu Chun;Peng Tianwei;Hu Xuexiang
通讯作者:
Hu Xuexiang
影响因子:
22.1
作者:
Zhenzhen Wu;Xingzhong Yuan;Hou Wang;Zhibin Wu;Longbo Jiang;Hui Wang;Lei Zhang;Zhihua Xiao
通讯作者:
Zhenzhen Wu;Xingzhong Yuan;Hou Wang;Zhibin Wu;Longbo Jiang;Hui Wang;Lei Zhang;Zhihua Xiao
影响因子:
11.4
作者:
Li, Guisheng;Zhang, Deqing;Leung, Michael K. H.
通讯作者:
Leung, Michael K. H.
影响因子:
22.1
作者:
Wu, Zhibin;Yuan, Xingzhong;Wang, Hou
通讯作者:
Wang, Hou