Reusable High Aspect Ratio 3-D Nickel Shadow Mask.
Reusable High Aspect Ratio 3-D Nickel Shadow Mask.
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DOI：
10.1109/jmems.2017.2654126
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发表时间：
2017-04
期刊：
影响因子：
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通讯作者：
Negi S
中科院分区：
文献类型：
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作者：
Shandhi MMH;Leber M;Hogan A;Warren DJ;Bhandari R;Negi S
荫罩技术多年来一直用于无抗蚀剂图案化以及在非常规表面、易碎基底和生物材料上进行图案化。在这项工作中，我们提出了一种新方法来制造高深宽比（15∶1）的三维（3D）镍（Ni）荫罩，其垂直图案的长度和宽度分别为1.2毫米和40微米。镍荫罩高1.5毫米，底部宽100微米。荫罩的深宽比为15。镍荫罩机械强度高，因此易于操作。它还可重复使用，并用于对非常规和复杂的3D几何形状（如微针或神经电极（如犹他阵列））的侧壁进行图案化。标准的犹他阵列在轴端有100个活性位点。使用所提出的高深宽比镍荫罩，犹他阵列可容纳300个活性位点，其中200个将位于轴上及轴周围。这种坚固的镍荫罩是使用激光图案化和电镀技术制造的。使用镍3D荫罩将降低制造平面外结构的成本、复杂性和时间。
Shadow Mask technology has been used over the years for resistless patterning and to pattern on unconventional surfaces, fragile substrate and biomaterial. In this work, we are presenting a novel method to fabricate high aspect ratio (15:1) three-dimensional (3D) Nickel (Ni) shadow mask with vertical pattern length and width of 1.2 mm and 40 μm respectively. The Ni shadow mask is 1.5 mm tall and 100 μm wide at the base. The aspect ratio of the shadow mask is 15. Ni shadow mask is mechanically robust and hence easy to handle. It is also reusable and used to pattern the sidewalls of unconventional and complex 3D geometries such as microneedles or neural electrodes (such as the Utah array). The standard Utah array has 100 active sites at the tip of the shaft. Using the proposed high aspect ratio Ni shadow mask, the Utah array can accommodate 300 active sites, 200 of which will be along and around the shaft. The robust Ni shadow mask is fabricated using laser patterning and electroplating techniques. The use of Ni 3D shadow mask will lower the fabrication cost, complexity and time for patterning out-of-plane structures.