Inactivation of Bacillus atrophaeus and of Aspergillus niger using beams of argon ions, of oxygen molecules and of oxygen atoms
Inactivation of Bacillus atrophaeus and of Aspergillus niger using beams of argon ions, of oxygen molecules and of oxygen atoms
复制标题
DOI：
10.1088/0022-3727/41/11/115207
复制
发表时间：
2008-06-07
影响因子：
3.4
通讯作者：
von Keudell, A.
中科院分区：
文献类型：
--
作者：
Raballand, V.;Benedikt, J.;von Keudell, A.
研究了用氩离子束、氧分子束和氧原子束灭活阿特菲芽孢杆菌和黑曲霉孢子。因此，模拟了在含氧低压等离子体中发生的条件，并可以揭示基本的失活机理。结果表明，O原子对孢子的活力没有影响，当O原子注量为3.5×10(19)cm(-2)时，孢子皮不发生蚀刻。能量为200 eV的Ar离子对1.15×10(18)cm(-2)以下的注量不会造成明显的侵蚀。然而，Ar离子和氧分子或原子的联合影响会导致孢子的显著蚀刻和显著的失活。这是由化学溅射过程解释的，在该过程中，孢子表面的离子诱导缺陷与入射的双自由基O(2)或入射的O原子反应。这导致CO、CO(2)和H(2)O的形成，从而导致侵蚀。
The inactivation of spores of Bacillus atrophaeus and of Aspergillus niger using beams of argon ions, of oxygen molecules and of oxygen atoms is studied. Thereby, the conditions occurring in oxygen containing low pressure plasmas are mimicked and fundamental inactivation mechanisms can be revealed. It is shown that the impact of O atoms has no effect on the viability of the spores and that no etching of the spore coat occurs up to an O atom fluence of 3.5 x 10(19) cm(-2). The impact of argon ions with an energy of 200 eV does not cause significant erosion for fluences up to 1.15 x 10(18) cm(-2). However, the combined impact of argon ions and oxygen molecules or atoms causes significant etching of the spores and significant inactivation. This is explained by the process of chemical sputtering, where an ion-induced defect at the surface of the spore reacts with either the incident bi-radical O(2) or with an incident O atom. This leads to the formation of CO, CO(2) and H(2)O and thus to erosion.