Multitarget sputtering of high magnetostrictive Tb‐Dy‐Fe films
Multitarget sputtering of high magnetostrictive Tb‐Dy‐Fe films
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DOI：
10.1063/1.355626
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发表时间：
1994-05
影响因子：
3.2
通讯作者：
E. Quandt
中科院分区：
文献类型：
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作者：
E. Quandt
采用多靶磁控溅射法制备了二元化合物TbxFe1−x和三元化合物（TbyDy1−y）xFe1−x的超磁致伸缩薄膜。鉴于它们在微系统技术中作为致动器的潜在用途，研究的重点是与低矫顽力相关的低场磁致伸缩性能。在Tb含量高于结晶Tb - Fe化合物的组合物范围内发现了巨磁致伸缩。根据不同的成分，可以在6 Oe的外加场和Hc<10 Oe的矫顽力场下制备出磁致伸缩大至λ <s:1> 450×10−6的非晶薄膜。与Tb - Fe相比，三元合金Tb - Dy - Fe的低场磁致伸缩的改善不如晶体材料明显，这可能是因为所有报道的薄膜都呈现垂直的易轴。薄膜的非晶态至少在300°C下是稳定的。
Giant magnetostrictive thin films of both the binary compound TbxFe1−x and the ternary compound (TbyDy1−y)xFe1−x have been prepared by multitarget magnetron sputtering in wide compositional ranges. In view of their potential use as actuators in microsystem technology the research was focused on low‐field magnetostrictive properties in connection with low coercivity. Giant magnetostriction was found for a range of compositions with Tb contents higher than those of the crystalline Tb‐Fe compounds. Depending on the composition, amorphous films with a magnetostriction as large as λ≊450×10−6 at an applied field of 6 kOe and a coercive field Hc<10 Oe could be prepared. The improvement of the low‐field magnetostriction of the ternary alloy Tb‐Dy‐Fe in comparison to Tb‐Fe was found to be less distinct than for crystalline materials, probably because all reported films showed a perpendicular easy axis. The amorphous state of the films are stable at least up to 300 °C.