Reaction Mechanism of the Photooxidation of the Toluene–NO2–O2–N2 System in the Gas Phase
Reaction Mechanism of the Photooxidation of the Toluene–NO2–O2–N2 System in the Gas Phase
复制标题
甲苯-NO2-O2-N2体系气相光氧化反应机理
DOI：
10.1246/bcsj.51.2496
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发表时间：
1978
影响因子：
4
通讯作者：
N. Washida
中科院分区：
文献类型：
--
作者：
H. Akimoto;M. Hoshino;G. Inoue;M. Okuda;N. Washida
在67 dm ~ 3反应室中研究了甲苯（34 ppm）-NO_2（8-207 ppm）-N_2和/或O_2（1atm）体系的光氧化。该反应是由NO2光解过程中生成的O（3 P）原子引发的。主要产物为苯甲醛、甲酚、硝酸苄酯、间硝基甲苯、6-硝基邻甲酚和2-硝基对甲酚。它们的相对产率作为反应物浓度的函数进行了研究。根据O（3 P）和OH自由基与甲苯在NO2和O2存在下的反应，提出了产物的形成机理。
Photooxidation of the toluene (34 ppm)–NO2(8–207 ppm)–N2 and/or O2(1 atm) system has been studied in a 67 dm3 reaction chamber. The reaction was initiated by O(3P) atoms formed in the photolysis of NO2. The main products were benzaldehyde, cresols, benzyl nitrate, m-nitrotoluene, 6-nitro-o-cresol, and 2-nitro-p-cresol. Their relative yields were studied as functions of reactant concentrations. The formation mechanisms of the products were proposed on the basis of the reactions of O(3P) and OH radicals with toluene in the presence of NO2 and O2.