Residual stresses in the elastoplastic multilayer thin film structures: The cases of Si/Al bilayer and Si/Al/SiO2 trilayer structures
Residual stresses in the elastoplastic multilayer thin film structures: The cases of Si/Al bilayer and Si/Al/SiO2 trilayer structures
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DOI：
10.1063/1.2832751
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发表时间：
2008-04
影响因子：
3.2
通讯作者：
Xian‐Cheng Zhang;Bin-shi Xu;F. Xuan
中科院分区：
文献类型：
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作者：
Xian‐Cheng Zhang;Bin-shi Xu;F. Xuan
开发了一个理论模型来预测弹塑性多层薄膜结构内的热残余应力。考虑了其中一层薄膜的塑性变形。对双层结构（即覆盖在基板上的薄膜）进行了特殊分析，因为它们更具有实际意义。导出了闭式解来估计薄膜中的残余应力和多层薄膜结构的曲率，以及温差和塑性区厚度之间的关系。研究了Si/Al双层和Si/Al/SiO2多层结构的情况来说明该模型的实现。在这些结构中，假设铝膜发生塑性变形。结果表明，对于两种结构，Al膜塑性区厚度与温差之间均存在线性关系。铝膜上沉积的SiO2层对Al熔断的临界温度有明显的影响...
A theoretical model was developed to predict the thermal residual stresses within the elastoplastic multilayer thin film structures. The plastic deformation of one of the films was considered. Special analyses were made on the bilayer structures, i.e., a film overlaid on a substrate, as they are more of practical interest. Closed-form solutions were derived to estimate the residual stresses in the films and curvature of the multilayer film structure, and the relationship between the temperature difference and the thickness of the plastic zone. The cases of Si/Al bilayer and Si/Al/SiO2 multilayer structures were studied to illustrate the implementation of this model. In these structures, Al film was assumed to be plastically deformed. Results showed that, for both structures, there was a linear relationship existing between the thickness of the plastic zone in Al film and the temperature difference. SiO2 layer deposited on the aluminum film had an obvious influence on the critical temperature at which Al f...