Fabrication of photovoltaic FeSxOy/ZnO heterostructures by electrochemical deposition
Fabrication of photovoltaic FeSxOy/ZnO heterostructures by electrochemical deposition
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DOI：
10.7567/1347-4065/ab1975
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发表时间：
2019-05
影响因子：
1.5
通讯作者：
W. Ji;M. Ichimura
中科院分区：
文献类型：
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作者：
W. Ji;M. Ichimura
采用电化学沉积（ECD）方法制备了FeSxOy/ZnO异质结构。首先用恒电流ECD法在ITO衬底上沉积ZnO，然后在ZnO上沉积FeSxOy。在FeSxOy的电子捕获检测中，除了直流偏压外，还采用了三级脉冲偏压。还检查了络合剂（酒石酸）的添加和溶液的搅拌。当溶液中含有酒石酸时，FeSxOy在ZnO上的沉积失败。在没有酒石酸的情况下，制备了具有整流电性能的FeSxOy/ZnO异质结。弱的光伏效应确认只有当FeSxOy通过三步脉冲与搅拌沉积。
FeSxOy/ZnO heterostructures are fabricated by the electrochemical deposition (ECD) method. ZnO is first deposited by galvanostatic ECD on indium-tin-oxide (ITO) substrate and then FeSxOy is deposited on ZnO. In ECD of FeSxOy, three-step pulse bias is adopted in addition to DC bias. The addition of a complexing agent (tartaric acid) and stirring of the solution is also examined. With tartaric acid in the solution, FeSxOy deposition on ZnO failed. Without tartaric acid, FeSxOy/ZnO heterojunctions showing rectifying electrical properties are fabricated. Weak photovoltaic effects are confirmed only when FeSxOy is deposited by three-step pulse with stirring.