Multi-functional ECR plasma sputtering system for preparing amorphous carbon and Al–O–Si films
Multi-functional ECR plasma sputtering system for preparing amorphous carbon and Al–O–Si films
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DOI：
10.1016/j.surfcoat.2011.09.001
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发表时间：
2011-12
影响因子：
5.4
通讯作者：
Xue Fan;Dong-feng Diao;Kai Wang;Chao Wang
中科院分区：
文献类型：
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作者：
Xue Fan;Dong-feng Diao;Kai Wang;Chao Wang
将带快门滑块的圆柱形双靶源设计应用于发散式镜像约束电子回旋共振（ECR）等离子溅射系统。利用该多功能系统可实现多种类型薄膜（单层纯膜、复合膜以及多层膜）的沉积工艺可行性。采用发散式ECR （DECR）和镜像约束ECR （MCECR）等离子溅射系统制备了备受关注的非晶碳膜。比较了两种材料的摩擦学性能，均显示摩擦系数在0.15左右。通过在薄膜制备过程中加入基片加热，DECR碳薄膜的摩擦学性能得到改善，摩擦系数明显降低至0.05，磨损寿命大大延长。利用所设计的带快门滑块的双靶源制备Al-O-Si薄膜，使硅与铝的靶面积比由0.5改变为2。利用多功能ECR等离子溅射系统，获得了在193nm波长下透射率高达89%的Al-O-Si复合薄膜结构。
A design of cylindrical double-target source with shutter slider which can continuously change the target area ratio was applied to the divergent and mirror-confinement Electron Cyclotron Resonance (ECR) plasma sputtering system in the present study. The deposition process feasibility of several types of films (single-layer of pure and composite film as well as multi-layer film) can be realized by using this multi-functional system. The highly concerned amorphous carbon films were prepared with the Divergent ECR (DECR) and Mirror-Confinement ECR (MCECR) plasma sputtering systems. The tribological properties were compared, which both showed a normally friction coefficient around 0.15. Through adding substrate heating during film preparation, the tribological properties of DECR carbon films were improved with an obvious decreasing of friction coefficient to 0.05 and a much longer wear lifetime. The designed double-target source with shutter slider was used to prepare Al–O–Si films, by which the target area ratio of silicon to aluminum was changed from 0.5 to 2. A composite structure of Al–O–Si film with high transmittance up to 89% at 193nm wavelength was obtained with the multi-functional ECR plasma sputtering system.