Enhanced Sputtering Yields from Single-Ion Impacts on Gold Nanorods
Enhanced Sputtering Yields from Single-Ion Impacts on Gold Nanorods
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DOI：
10.1103/physrevlett.111.065504
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发表时间：
2013-08-08
影响因子：
8.6
通讯作者：
Donnelly, S. E.
中科院分区：
文献类型：
--
作者：
Greaves, G.;Hinks, J. A.;Donnelly, S. E.
溅射产率，提高了一个数量级以上，已观察到80 keV的单晶Au纳米棒的离子辐照。产率在100-1900原子/离子的范围内，而平坦表面的值约为50。这种增强的结果部分来自碰撞级联和随后的热尖峰到纳米棒表面的接近。分子动力学模型表明，入射角的范围内发生的纳米棒的照射和更大数量的原子在“爆炸性喷射”的原子团簇作出显着的贡献，提高产量。
Sputtering yields, enhanced by more than an order of magnitude, have been observed for 80 keV Xe ion irradiation of monocrystalline Au nanorods. Yields are in the range 100-1900 atoms/ion compared with values for a flat surface of approximate to 50. This enhancement results in part from the proximity of collision cascades and ensuing thermal spikes to the nanorod surfaces. Molecular dynamic modeling reveals that the range of incident angles occurring for irradiation of nanorods and the larger number of atoms in "explosively ejected" atomic clusters make a significant contribution to the enhanced yield.