Kinetics and dynamics of planar abnormal grain growth in nanocrystalline nickel
Kinetics and dynamics of planar abnormal grain growth in nanocrystalline nickel
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DOI：
10.1016/j.actamat.2017.08.068
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发表时间：
2017-12
期刊：
影响因子：
9.4
通讯作者：
J. Darnbrough;F. Christien;P. Flewitt
中科院分区：
文献类型：
--
作者：
J. Darnbrough;F. Christien;P. Flewitt
以前，通过热处理后的电子成像和现场硬度测量，已经直接观察到纳米晶镍中异常大颗粒的生长。然而，增长的形式和速度是间接推导出来的。本工作利用原位热处理结合背散射电子成像的方法，证明了反常的微平面小面晶粒的长大不仅与周围环境有关，而且与生长小面的取向有关。这一观察表明，晶粒以半约束的方式生长，使得高指数面(如{211})的生长速度快于稳定的{111}面。
Growth of abnormally large grains has been observed previously in nanocrystalline Nickel both in-directly by electron imaging after heat treatment and byin-situresistivity measurement. However the form and rate of the growth has been derived indirectly. This work makes use ofin-situheat treatment combined with back scattered electron imaging illustrates that the abnormal micro-planar faceted grains grow with a dependence not only on the surrounding but also as the orientation of the growing facet. This observation has shown that the grains grow in a semi-constrained manner such that high index faces such as {211} grow faster than stable {111} faces.